Title:
PHOTOACID GENERATORS
Document Type and Number:
Japanese Patent JP2017002047
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photoacid generator compound that does not cause decomposition products that can coat and corrode optic elements in chemically amplified photoresists for microelectronics applications.SOLUTION: A photoacid generator compound has a compound that comprises a cation of a structure represented by formula (V) and forming a pair with an anion such as sulfonic acid or sulfonamide (X is S or I; one of Ar1 and Ar2 is a C10-30 condensed polycyclic aryl group and the other is a single bond polycyclic aryl group).SELECTED DRAWING: None
Inventors:
THACKERAY JAMES W
COLEY SUZANNE M
CAMERON JAMES F
PAUL J LABEAUME
ONGAYI OWENDI
JAIN VIPUL
AHMAD E MADKOUR
COLEY SUZANNE M
CAMERON JAMES F
PAUL J LABEAUME
ONGAYI OWENDI
JAIN VIPUL
AHMAD E MADKOUR
Application Number:
JP2016120782A
Publication Date:
January 05, 2017
Filing Date:
June 17, 2016
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
DOW GLOBAL TECHNOLOGIES LLC
DOW GLOBAL TECHNOLOGIES LLC
International Classes:
C07C381/12; C07C25/00; C07C43/29; C07C309/04; C07C309/28; C08F212/14; C08F220/12; C08F220/26
Domestic Patent References:
| JP2004151184A | 2004-05-27 | |||
| JP2008308520A | 2008-12-25 | |||
| JP2009300978A | 2009-12-24 | |||
| JP2010163604A | 2010-07-29 | |||
| JP2004521372A | 2004-07-15 | |||
| JP6049250B2 | 2016-12-21 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office