Title:
PHOTOACTIVE COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE SAME, AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2023152862
Kind Code:
A
Abstract:
To provide a photoactive compound, a photoresist composition containing the same, and a pattern formation method.SOLUTION: A photoactive compound is represented by formula (1a) or (1b). (In formula, R1 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl comprising an aromatic ring heteroatom selected from nitrogen, oxygen, or a combination thereof; R2-R3 are as provided in the specification; R4 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; and M+ is an organic cation.)
Inventors:
EMAD AQAD
PAKU JON GUN
CEN YINJIE
LEE CHOONG-BONG
PAKU JON GUN
CEN YINJIE
LEE CHOONG-BONG
Application Number:
JP2023046501A
Publication Date:
October 17, 2023
Filing Date:
March 23, 2023
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C07C255/23; C07C25/18; C07C57/26; C07C57/42; C07C63/06; C07C381/12; C07D333/24; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Senda International Patent Office
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