Title:
光触媒塗布液、光触媒構造体及びその製造方法
Document Type and Number:
Japanese Patent JP6850348
Kind Code:
B2
Abstract:
The present invention addresses the problem of providing: a photocatalyst application liquid which is for easily forming a photocatalyst layer that has excellent strength and exhibits sufficient photocatalytic activity, and a production method therefor; and a photocatalytic structure having a photocatalyst layer that has excellent strength and exhibits sufficient photocatalytic activity, and a production method therefor. This photocatalyst application liquid production method comprises: a step for mixing a hydrolysable silane compound represented by formula (1): Si(OR)4 (in the formula, each R represents an alkyl group having 1-4 carbon atoms, wherein the four R's may be the same or different from each other), a monovalent alcohol having 1-4 carbon atoms, an acid, water, and fine particles of a photocatalytic material so as to prepare a mixture wherein the contained amount of the hydrolysable silane compound is at most 5 mass% in SiO2 equivalent, and the molar ratio (water/hydrolysable group) between the hydrolysable group in the hydrolysable silane compound and the water is at least 8, and the contained amount of the monovalent alcohol having 1-4 carbon atoms is 20-50 mass%; and a step for subjecting the hydrolysable silane compound in the mixture to hydrolysis or hydrolytic condensation using the acid as a catalyst.
Inventors:
Daiya Kobayashi
Mitsuhiro Yanagida
Mitsuhiro Yanagida
Application Number:
JP2019526845A
Publication Date:
March 31, 2021
Filing Date:
June 21, 2018
Export Citation:
Assignee:
Nippon Soda Co., Ltd.
International Classes:
B01J35/02; B01J37/02; B01J37/08; C09D7/61; C09D7/63; C09D183/06
Domestic Patent References:
JP2002146283A | ||||
JP2015226858A | ||||
JP2001198474A | ||||
JP11197513A | ||||
JP10180115A | ||||
JP2003155448A | ||||
JP2000051708A | ||||
JP2002180005A |
Attorney, Agent or Firm:
Masaki Hirota
Seiji Ozawa
Yusaku Tokai
Yasunori Matsuhashi
Makoto Horiuchi
Masako Yamauchi
Shuichi Sonomoto
Akihiro Yamamura
Hiroyuki Tomita
Seiji Ozawa
Yusaku Tokai
Yasunori Matsuhashi
Makoto Horiuchi
Masako Yamauchi
Shuichi Sonomoto
Akihiro Yamamura
Hiroyuki Tomita