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Title:
光触媒被覆材及びその製造方法、並びに該光触媒被覆材を使用する汚染物質含有物浄化方法及び汚染物質含有物浄化装置
Document Type and Number:
Japanese Patent JP4689809
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photocatalyst coated material excellent in both photocatalytic property and durability and the manufacturing method and to provide a contaminant-containing material cleaning method by the photocatalyst, which is practically suitable in the view point of the durability without generating the stripping of a photocatalyst film and capable of effectively decomposing and removing the contaminant by the use of the photocatalyst coated material and the contaminant-containing material purifying device by the photocatalyst. SOLUTION: The photocatalyst coated material is structured by forming the photocatalyst film containing >=90 vol.% anatase type and/or rutile type titanium oxide crystal on a titanium based alloy base material, the titanium base alloy base material contains >=70 mass % titanium, the thickness of the photocatalyst film is >=0.1 μm and exists between the titanium base alloy base material and the photocatalyst and the thickness of an inevitable thin film different from the titanium oxide crystal or the titanium base alloy crystal is <=0.05 μm.

Inventors:
Tatsuya Yasunaga
Toshiki Sato
Application Number:
JP2000305917A
Publication Date:
May 25, 2011
Filing Date:
October 05, 2000
Export Citation:
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Assignee:
KABUSHIKI KAISHA KOBE SEIKO SHO
International Classes:
B01J35/02; A61L9/00; F24F7/06; A61L9/20; B01D53/86; B01J21/06; B01J23/745; B01J32/00; B01J37/02; B01J37/14; B09B3/00; C02F1/32; C02F1/72
Domestic Patent References:
JP8246192A
JP6205977A
JP10121266A
Attorney, Agent or Firm:
Yoshiyuki Kaji