To provide a photocatalytic member which is excellent in friction fastness, particularly, wiping resistance and is hardly damaged.
The photocatalytic member A is formed by layering a photocatalyst layer 3 containing a photocatalyst particle on a base material 1 and dispersing a thermosetting resin area 4 in the photocatalyst layer 3 so that the thermosetting resin area is projected from the surface of the photocatalyst layer 3 or buried in the photocatalyst layer to form one and the same surface as that of the photocatalyst layer 3. Since the photocatalyst layer 3 is protected by the projected or buried thermosetting resin area 4, the friction fastness, particularly, wiping resistance of the photocatalytic member A is improved and the damage preventing property thereof is also improved.
COPYRIGHT: (C)2008,JPO&INPIT
Takaki Suzuki
Atsushi Sakauchi
Hanzawa Masaru
Makoto Ihira
JP2001322222A | ||||
JP11076834A | ||||
JP2006175685A | ||||
JP2007090711A | ||||
JP2001276613A | ||||
JP2005046680A | ||||
JP2003071967A | ||||
JP2007289905A | ||||
JP2002294565A | ||||
JP2005014350A | ||||
JP2004299082A | ||||
JP2001260597A | ||||
JP2005205378A | ||||
JP2000246115A |