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Title:
光触媒部材
Document Type and Number:
Japanese Patent JP4776443
Kind Code:
B2
Abstract:

To provide a photocatalytic member which is excellent in friction fastness, particularly, wiping resistance and is hardly damaged.

The photocatalytic member A is formed by layering a photocatalyst layer 3 containing a photocatalyst particle on a base material 1 and dispersing a thermosetting resin area 4 in the photocatalyst layer 3 so that the thermosetting resin area is projected from the surface of the photocatalyst layer 3 or buried in the photocatalyst layer to form one and the same surface as that of the photocatalyst layer 3. Since the photocatalyst layer 3 is protected by the projected or buried thermosetting resin area 4, the friction fastness, particularly, wiping resistance of the photocatalytic member A is improved and the damage preventing property thereof is also improved.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Seiko Matsukawa
Takaki Suzuki
Atsushi Sakauchi
Hanzawa Masaru
Makoto Ihira
Application Number:
JP2006151083A
Publication Date:
September 21, 2011
Filing Date:
May 31, 2006
Export Citation:
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Assignee:
Takiron Co., Ltd.
International Classes:
B01J35/02; B01J33/00; B32B9/00; B32B27/42
Domestic Patent References:
JP2001322222A
JP11076834A
JP2006175685A
JP2007090711A
JP2001276613A
JP2005046680A
JP2003071967A
JP2007289905A
JP2002294565A
JP2005014350A
JP2004299082A
JP2001260597A
JP2005205378A
JP2000246115A
Attorney, Agent or Firm:
河▲崎▼ 眞樹