Title:
光触媒装置
Document Type and Number:
Japanese Patent JP4590118
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photocatalytic film having high peeling strength and high photocatalytic performance. SOLUTION: This photocatalytic film 10 has an underlaid layer 13 deposited on the surface of a substrate 11. The film thickness of an activation intercepting layer 15 can be made thick since the substrate 11 is protected by the layer 13 and is not deformed when the layer 15 is deposited by a sputtering method or the like. A titanium oxide-made photocatalyst layer 17 having an excellent crystal structure can be obtained since the substrate 11 is protected by the thick layer 15 when the layer 17 is deposited. Since the hardness of the film 10 becomes higher as a whole when the film thickness of the layer 15 is made thick, the photocatalytic performance of the film 10 can be made high and the solid film 10 can be manufactured without deforming the substrate 11.
Inventors:
Takahiro Takahiro
Nobutada Takahashi
Kenichi Takagi
Hideaki Hara
Nobutada Takahashi
Kenichi Takagi
Hideaki Hara
Application Number:
JP2001051641A
Publication Date:
December 01, 2010
Filing Date:
February 27, 2001
Export Citation:
Assignee:
ULVAC, Inc.
Takagi Seiko Co., Ltd.
Toyama Prefecture
Takagi Seiko Co., Ltd.
Toyama Prefecture
International Classes:
B01J35/02; B01J21/08; B32B9/00; B01J37/02; C23C14/08; C23C16/40
Domestic Patent References:
| JP11348172A | ||||
| JP2000096212A | ||||
| JP10329261A | ||||
| JP2000033271A | ||||
| JP2000296332A | ||||
| JP10278168A |
Attorney, Agent or Firm:
Shigeo Ishijima
Hideki Abe
Hideki Abe