Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
Japanese Patent JP2017025150
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable composition capable of giving a cured product which has a narrow molecular weight distribution and is free of residual monomers.SOLUTION: The photocurable composition is used which contains a compound (A) represented by general formula (1), an organic halogen compound (B), and a radically polymerizable compound (C). In the general formula (1), at least one of Rto Ris preferably a 1-20C alkoxy group or a 1-20C alkylthio group. The organic halogen compound (B) is preferably a compound (B1) represented by general formula (2).SELECTED DRAWING: None
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Inventors:
MOTOFUJI AZUSAHEI
OTA TOMOYA
OTA TOMOYA
Application Number:
JP2015142823A
Publication Date:
February 02, 2017
Filing Date:
July 17, 2015
Export Citation:
Assignee:
SANYO CHEMICAL IND LTD
International Classes:
C08F2/44; C08F2/38; C08F2/50; C08F26/10; C08K5/101; C08K5/46; C08L101/00; C09D4/00; C09D7/12; C09D11/00; C09J4/00; C09J11/06; G03F7/004; G03F7/029; H01L23/29; H01L23/31