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Title:
PHOTOCURABLE RESIN COMPOSITION AND ITS CURED ITEM
Document Type and Number:
Japanese Patent JP2003020339
Kind Code:
A
Abstract:

To provide a photocurable resin composition which gives a cured product excellent in adhesiveness, resistances to heat, chemicals, and plating, liquid crystal staining properties, etc.; and a cured product of the same.

The resin composition contains (A) a photo-induced base generator and (B) a compound having at least one heterocyclic backbone, base generator A being a compound having a 1,4-dihydropyridine backbone optionally having an N-substituted group.


Inventors:
KOYANAGI TAKAO
TANAKA RYUTARO
Application Number:
JP2001208964A
Publication Date:
January 24, 2003
Filing Date:
July 10, 2001
Export Citation:
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Assignee:
NIPPON KAYAKU KK
International Classes:
G03F7/004; C08G59/68; C08G65/18; C08G85/00; G03F7/031; G03F7/38; H05K3/18; H05K3/28; H05K3/46; (IPC1-7): C08G85/00; C08G59/68; C08G65/18; G03F7/004; G03F7/031; G03F7/38; H05K3/18; H05K3/28; H05K3/46