Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2001026608
Kind Code:
A
Abstract:
To provide a polyene or polyene/polythiol photocurable resin compsns. having good storage stability.
This photocurable resin compsn. contains a polyene (1), a photopolymn. initiator (2), and, if necessary, a polythiol (3), and a metal content is not more than 50 ppm. The polyene is pref. at least one selected from the group consisting of triallyl isocyanurate, triallyl cyanurate, and diallyl maleate, and the polythiol is pref. an ester of a mercaptocarboxylic acid and a polyhydric alcohol.
Inventors:
HOSHINO HISAO
KAZAMI JUNICHI
OTSUKA NOBUYUKI
KAZAMI JUNICHI
OTSUKA NOBUYUKI
Application Number:
JP2000135540A
Publication Date:
January 30, 2001
Filing Date:
May 09, 2000
Export Citation:
Assignee:
DENKI KAGAKU KOGYO KK
International Classes:
C08F2/46; C08F36/00; C08F36/02; C08F36/22; C08G75/04; C08G75/045; (IPC1-7): C08F2/46; C08F36/00; C08F36/02; C08F36/22; C08G75/04
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