PHOTOCURING COMPOSITION - Nippon Shokubai Co., Ltd.

Title:

PHOTOCURING COMPOSITION

Document Type and Number:

Japanese Patent JP3892294

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a photocuring composition and an inorganic powder- containing photocuring composition having sufficient photocuring property, giving a pattern of high resolution when a photolithographic method is used, and showing excellent pyrolytic property during calcination.
SOLUTION: The photocuring composition comprises a compound (A1) having a group having a (meth)acryloyl group and a photopolymerization initiator (B). The group having a (meth)acryloyl group is expressed by general formula (1) and/or general formula (2). In formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an organic residue and R3 represents a hydrogen atom or an organic residue. In formula (2), R4 represents a hydrogen atom or a methyl group, R5 represents an organic residue and R6 represents a hydrogen atom or an organic residue.

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Inventors:

Toshio Awaji
Akihiko Fukada

Application Number:

JP2001395247A

Publication Date:

March 14, 2007

Filing Date:

December 26, 2001

Export Citation:

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Assignee:

Nippon Shokubai Co., Ltd.

International Classes:

G03F7/027; C08F2/44; C08F20/26; C08F299/02; G03F7/004; (IPC1-7): G03F7/027; C08F2/44; C08F20/26; C08F299/02; G03F7/004

Domestic Patent References:

JP2001166463A
JP2000298344A
JP2001264973A
JP2001242615A
JP11249300A

Attorney, Agent or Firm:

Yasuo Yasutomi
Takanori Tamai

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