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Title:
PHOTOELECTRIC CONVERSION TARGET AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JPS5946738
Kind Code:
A
Abstract:

PURPOSE: To reduce baking and residual image events under low illumination and obtain a good spectral sensitivity characteristic by joining the Sb2S3 area with different Sb concentrations and gradually varying the Sb concentration of a porous layer.

CONSTITUTION: A photoelectric conversion target is comprised with a transparent conductive layer 2 applied and formed on a substrate 1, the first dense layer 3 made of Sb2S3 or Sb2S3 with excessive Sb applied and formed on the transparent conductive layer 2, the second dense layer 4 whose primary component is the Sb2S3 with excessive Sb applied and formed on the first dense layer 3, porous layers 5 and 6 whose primary component is the Sb2S3 formed on the second dense layer 4, and the third dense layer 7 whose primary component is the Sb2S3 with excessive Sb applied and formed on the porous layers 5 and 6. In addition, the Sb concentration of the said porous layers 5 and 6 is gradually or continuously increased as the layers go to the third dense layer 7.


Inventors:
YAMAMOTO JIYUNTA
ICHIBAGASE TAKESHI
Application Number:
JP15769182A
Publication Date:
March 16, 1984
Filing Date:
September 09, 1982
Export Citation:
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Assignee:
MATSUSHITA ELECTRONICS CORP
International Classes:
H01J9/233; H01J29/45; H01L31/08; (IPC1-7): H01J9/233; H01J29/45; H01L31/10
Domestic Patent References:
JPS50146214A1975-11-22
JPS5534979A1980-03-11
Attorney, Agent or Firm:
Shigetaka Awano (1 person outside)



 
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