To manufacture a high-quality photomask blank having extremely little defect by easily and reliably removing a foreign matter or the like depositing on the surface of a light transmitting substrate (the principal surface and the end faces comprising side faces and chamfered faces).
The method for manufacturing a photomask blank includes: cleaning the surface of a transparent substrate 1; and then forming a thin film as a transfer pattern to be transferred to a transfer material on the surface of the transparent substrate, wherein the surface of the transparent substrate is cleaned by carrying out surface improvement process to improve wettability of the surface of the transparent substrate by using, for example, a UV irradiation apparatus, and then the end faces of the surface of the transparent substrate are cleaned by using an end face cleaning apparatus, afterward the principal surface is subjected to at least one of scrub cleaning by using a cleaning tool, two-fluid spray cleaning by using a two-fluid spray nozzle 13, ultrasonic cleaning by using a ultrasonic cleaning nozzle 14, or the like.
COPYRIGHT: (C)2005,JPO&NCIPI
Osamu Hanaoka
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Toru Yui
Hitoshi Kiyono