Title:
PHOTOMASK CAPABLE OF DETECTING MISALIGNMENT OF EXPOSURE POSITION AND COLOR FILTER USING THE SAME
Document Type and Number:
Japanese Patent JP2022060725
Kind Code:
A
Abstract:
To provide means for detecting defects due to misalignment of photomasks that cannot normally be detected by periodic pattern comparison.SOLUTION: There is provided a photomask used for a pigmented layer of a color filter substrate in which a black matrix layer and a pigmented layer are formed in order, a pigmented layer pattern having a stripe- or island-shaped shielding pattern. This photomask is characterized by having at edges of the pigmented layer pattern formed by the photomask a projected additional pattern on the outside of the pigmented layer pattern that has a non-periodic array.SELECTED DRAWING: Figure 12
Inventors:
MOTODA YOSHINORI
OKUMURA TETSUTO
NISHIZAWA YOSHIKI
MIZUTANI RYOTA
OKUMURA TETSUTO
NISHIZAWA YOSHIKI
MIZUTANI RYOTA
Application Number:
JP2020168370A
Publication Date:
April 15, 2022
Filing Date:
October 05, 2020
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G02B5/20; G03F1/44; G03F7/20; G03F9/00
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