PURPOSE: To prevent a mask pattern from being damaged by providing a controller which slows down the rotation of a support plate according to the chromium area ratio of a mask and adjusts a heating means corresponding to the rotation when the mask after being cleaned is dried.

CONSTITUTION: This device is equipped with a rotary support plate 2 where the photomask 1 to be cleaned is mounted, a cleaning nozzle 4 which jets cleaning liquid to the photomask 1, and a drying means which dries the photomask 1. Then, a controller 20 is provided which controls the rotating speed of the rotary support plate 2 according to the area ratio of chromium in the photomask 1 so that no static electricity is generated and controls the drying means. The controller 20 lowers the rotating speed of a motor during drying the operation so that static electricity is hardly generated by friction against air, and further lowers the output of an infrared-ray lamp 6 so as to prevent an overheating state when the drying time becomes long.