フォトマスクの描画装置 - SK Electronics Co., Ltd.

Title:

フォトマスクの描画装置

Document Type and Number:

Japanese Patent JP7220066

Kind Code:

B2

Abstract:

To provide a drawing device for a photomask, in which the number of processes of manufacturing a multi-gradation photomask can be reduced by forming a photoresist pattern with different film thicknesses on a photomask substrate by a single exposure process.SOLUTION: The drawing device temporally controls a micromirror array in which a plurality of micromirrors each independently variable for a tilt angle is arranged to be in a first state and a second state determined by the tilt angle, irradiates a photoresist on a photomask substrate mounted on a stage via an optical system arranged in such a manner that only laser light reflected by the micromirror in the first state is incident to the photoresist, and thereby can form a photoresist pattern having different film thicknesses by a single exposure process. The drawing device also includes a light quantity measuring unit, and can measure an intensity distribution of laser light and monitor the intensity distribution.SELECTED DRAWING: Figure 1

Inventors:

Isamu Tanabe

Application Number:

JP2018226749A

Publication Date:

February 09, 2023

Filing Date:

December 03, 2018

Export Citation:

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