Title:
PHOTOMASK INSPECTION METHOD AND PHOTOMASK MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2015225257
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photomask inspection method and a photomask manufacturing method, capable of obtaining the optical concentration of a photomask light shielding region pattern with high accuracy.SOLUTION: A light shielding region with a light shielding region pattern 15 of a photomask 10 is formed and a transparent region 14 where a transparent substrate 13 is exposed are irradiated with excimer laser light 21a, 21b, having the same wavelength as exposure light. The light intensity distribution of each of first transmission light 22a passing through the light shielding region and second transmission light 22b passing through the transparent region is measured by an imaging device. The light intensity distributions of the first transmission light 22a and the second transmission light 22b thus measured are compared to obtain the optical concentration of the light shielding region pattern 15.
Inventors:
NISHIGUCHI MASAHARU
Application Number:
JP2014110667A
Publication Date:
December 14, 2015
Filing Date:
May 28, 2014
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G03F1/84
Domestic Patent References:
| JP2010079192A | 2010-04-08 | |||
| JPH07104458A | 1995-04-21 | |||
| JPH06130651A | 1994-05-13 | |||
| JPH08124828A | 1996-05-17 | |||
| JPH08124828A | 1996-05-17 | |||
| JP2010079192A | 2010-04-08 | |||
| JPH07104458A | 1995-04-21 | |||
| JPH06130651A | 1994-05-13 | |||
| JP2011008021A | 2011-01-13 | |||
| JP2002251000A | 2002-09-06 | |||
| JPH07333827A | 1995-12-22 | |||
| JP2006078991A | 2006-03-23 | |||
| JPH0894338A | 1996-04-12 | |||
| JPH02210250A | 1990-08-21 | |||
| JPH08106154A | 1996-04-23 | |||
| JP2011008021A | 2011-01-13 | |||
| JP2002251000A | 2002-09-06 | |||
| JPH07333827A | 1995-12-22 | |||
| JP2006078991A | 2006-03-23 | |||
| JPH0894338A | 1996-04-12 | |||
| JPH02210250A | 1990-08-21 | |||
| JPH08106154A | 1996-04-23 |
Foreign References:
| US20110090329A1 | 2011-04-21 | |||
| WO2013011112A1 | 2013-01-24 | |||
| US20110090329A1 | 2011-04-21 | |||
| WO2013011112A1 | 2013-01-24 | |||
| US20080041716A1 | 2008-02-21 | |||
| US20080041716A1 | 2008-02-21 |
Attorney, Agent or Firm:
Hiromi Fujimasu
Keiko Fukamachi
Hideo Ito
Naoki Goto
Yusuke Ito
Hideyuki Tateishi
Keiko Fukamachi
Hideo Ito
Naoki Goto
Yusuke Ito
Hideyuki Tateishi