Title:
フォトマスク及びその製造方法
Document Type and Number:
Japanese Patent JP7214815
Kind Code:
B2
Abstract:
To provide a photomask and a method for producing the same in which patterns having different optical characteristics can be formed while an occurrence of a superposition error during exposure is suppressed.SOLUTION: A photomask blanks having a lower layer film and an upper layer film, which are a semi-transmissive film or a phase shift film constituted of materials having different etching characteristics to each other, is prepared on a transmissive substrate, a resist film formed on the upper layer film is exposed to form a first region, a second region and a third region having different exposure amounts, the upper layer film and the lower layer film are etched after selectively removing the first region, the second region is then selectively removed, the upper layer film is selectively etched for the lower layer film, and then the third region is removed.SELECTED DRAWING: Figure 2
Inventors:
Kumiko Moriyama
Shingo Yamada
Shingo Yamada
Application Number:
JP2021174507A
Publication Date:
January 30, 2023
Filing Date:
October 26, 2021
Export Citation:
Assignee:
SK Electronics Co., Ltd.
International Classes:
G03F1/32; C23C14/06
Domestic Patent References:
| JP6230556A | ||||
| JP8328235A | ||||
| JP10020476A | ||||
| JP11125894A | ||||
| JP2000181048A | ||||
| JP2002189280A | ||||
| JP2004301993A | ||||
| JP2005091855A | ||||
| JP2010198006A | ||||
| JP2011013382A | ||||
| JP2013134435A |
Foreign References:
| US5853923 | ||||
| US5888678 | ||||
| US6007324 |
Attorney, Agent or Firm:
Patent Attorney Corporation M & Partners
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