Title:
PHOTOMASK
Document Type and Number:
Japanese Patent JPH04291344
Kind Code:
A
Abstract:
PURPOSE: To offer a photomask which is able to enlarge depth of focus (margin) in the photomask used to form a layout pattern of a semiconductor device.
CONSTITUTION: In the photomask for the layout pattern of a semiconductor device made from the main pattern 1, consisting of the repeating pattern A, and a peripheral pattern, at least one or above of the dummy pattern B which is the same shape as the repeating pattern A is formed on the end of main pattern.
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Inventors:
TOMITA HIROYOSHI
Application Number:
JP5651291A
Publication Date:
October 15, 1992
Filing Date:
March 20, 1991
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F1/36; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Aoki Akira (4 outside)