Title:
フォトマスク及びフォトマスクブランクス
Document Type and Number:
Japanese Patent JP7087705
Kind Code:
B2
Abstract:
To provide a photomask that resists deteriorating of performance even when irradiated with a laser beam of high energy density, and a photomask blank.SOLUTION: A photomask has a transparent glass substrate having a first face and a second face facing the first face, a light-blocking pattern that has a light-blocking part and an opening and is provided on the first face of the transparent glass substrate, and an antioxidation layer that covers at least the light-blocking part and can prevent the oxidation of a material constituting the light-blocking part, the antioxidation layer composed of AlO.SELECTED DRAWING: Figure 1
Inventors:
Yusuke Shoji
Yoshimasa Kawaguchi
Morikawa Yasuko
Yuzu Ikeuchi
Yoshimasa Kawaguchi
Morikawa Yasuko
Yuzu Ikeuchi
Application Number:
JP2018113382A
Publication Date:
June 21, 2022
Filing Date:
June 14, 2018
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
G03F1/48
Domestic Patent References:
| JP4233541A | ||||
| JP5232678A | ||||
| JP6003804A | ||||
| JP62036669A |
Attorney, Agent or Firm:
Masataka Ota
Yasuhiro Kanamori
Yasuhiro Kanamori
Previous Patent: Cell culture system and cell culture method
Next Patent: Folding tool for formwork separator
Next Patent: Folding tool for formwork separator