Title:
フォトニック結晶の製造方法
Document Type and Number:
Japanese Patent JP2007515675
Kind Code:
A
Abstract:
A process for producing photonic crystals comprises (a) providing a substantially inorganic photoreactive composition; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; and (c) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space.
Inventors:
Anderson, Mark Tee.
Leatherdale, Catherine A.
Thompson, Scott Dee.
Leatherdale, Catherine A.
Thompson, Scott Dee.
Application Number:
JP2006542612A
Publication Date:
June 14, 2007
Filing Date:
November 18, 2004
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES COMPANY
International Classes:
G02B1/02; C03C17/00; C03C17/30; C08F2/50; C08G59/68; C08K3/00; C08L63/00; C30B29/60; G02B6/12; G02B6/122; G02B6/136; G02B6/138
Domestic Patent References:
| JP2002525696A | 2002-08-13 | |||
| JP2003510630A | 2003-03-18 | |||
| JPS5638350A | 1981-04-13 |
Foreign References:
| WO2001096958A2 | 2001-12-20 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu