Title:
PHOTOPOLYMERIZABLE COMPOSITION AND IMAGE FORMING MATERIAL
Document Type and Number:
Japanese Patent JP2001183825
Kind Code:
A
Abstract:
To provide a photosensitive composition having high sensitivity and excellent storage stability which is hardly polymerized by oxygen.
In the photopolymerizable composition containing (a) a compound containing ethylenic unsaturated double bonds, (b) an IR absorbent and (c) a polymerization initiator, the compound containing ethylenic unsaturated double bonds contains a compound having a partial structure expressed by formula (1) and a compound having a partial structure expressed by formula (2). In formula (1), R1 is a hydrogen atom or methyl group, and in formula (2), R2 is a hydrogen atom or methyl group.
Inventors:
TAKASAKI RYUICHIRO
Application Number:
JP36372299A
Publication Date:
July 06, 2001
Filing Date:
December 22, 1999
Export Citation:
Assignee:
MITSUBISHI CHEM CORP
International Classes:
G03F7/027; C08F2/46; C08F261/06; C08F265/04; G03F7/00; (IPC1-7): G03F7/027; C08F2/46; C08F261/06; C08F265/04; G03F7/00
Attorney, Agent or Firm:
Hasegawa Moji