Title:
PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PLATE USING THE SAME
Document Type and Number:
Japanese Patent JP3277808
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photopolymerizable composition having good sensitivity and developability.
SOLUTION: In this photopolymerizable composition containing a compound having addition-polymerizable ethylenic unsaturations and a photopolymerization initiator, the compound having addition-polymerizable ethylenic unsaturations comprises a mixture containing a compound having two or more urethane bonds and six or more ethylenic unsaturations and a compound freed from any urethane bond and having three or more ethylenic unsaturations in a weight ratio of (4:1) to (1:4).
Inventors:
Mitsuru Sasaki
Fumiyuki Matsuo
Toshiaki Yokoo
Fumiyuki Matsuo
Toshiaki Yokoo
Application Number:
JP10919096A
Publication Date:
April 22, 2002
Filing Date:
April 30, 1996
Export Citation:
Assignee:
Mitsubishi Chemical Corporation
International Classes:
G03F7/027; C08F2/48; C08F26/00; C08F226/00; G03F7/00; G03F7/028; (IPC1-7): G03F7/027; C08F2/48; C08F226/00; G03F7/00; G03F7/028
Domestic Patent References:
| JP64948A | ||||
| JP6136078A | ||||
| JP63137933A | ||||
| JP4168161A | ||||
| JP4332767A |
Attorney, Agent or Firm:
Koji Hasegawa
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