Title:
PHOTOPOLYMERIZABLE COMPOSITION
Document Type and Number:
Japanese Patent JP3536879
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photopolymerizable composition which has a sufficient tolerance of an operation time under the influence of environmental light and can be rapidly cured under the influence of light from a light irradiator to give a product of a high curing depth by adding a small amount of an α- alkylstyrene and/or an α-alkylstyrene dimer (C) to a photopolymerizable composition comprising a polymerizable vinyl monomer (A) and a photopolymerization initiator (B).
SOLUTION: Component A used is a polymerizable vinyl monomer having an acryloyl group and/or a methacryloyl group, particularly desirably a mixed system comprising bisphenol A glycidyl methacrylate, bismethacryloylethoxyphenylpropane and triethylene glycol dimethacrylate. Component B used is a combination of a photosensitizer (e.g. α-diketone) with a reducing agent (e.g. tert. amine), and the photosensitizer is used in an amount to give a weight ratio to the reducing agent of 0.2-3. The mixing ratio is such that 0.1-3 pts.wt. component B and 0.01-1 pt.wt. component C are used per 100 pts.wt. component A.
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Inventors:
Kikuchi, Hideki
Yuasa, Shigeki
Yuasa, Shigeki
Application Number:
JP34008795A
Publication Date:
June 14, 2004
Filing Date:
December 27, 1995
Export Citation:
Assignee:
TOKUYAMA CORP
International Classes:
A61K6/083; C08F2/48; C08F212/00; C08F212/08; (IPC1-7): C08F2/48; A61K6/083
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