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Title:
光重合性、光開裂性樹脂及び低収縮、低応力複合組成物
Document Type and Number:
Japanese Patent JP2009540058
Kind Code:
A
Abstract:
A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.

Inventors:
Xiao Ming, Jin
Hammesfar, Paul Dee.
Application Number:
JP2009514425A
Publication Date:
November 19, 2009
Filing Date:
June 08, 2007
Export Citation:
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Assignee:
Dentsply International,Inc.
International Classes:
C08F2/48; A61K6/884; A61K6/891; C07C69/716; C08F220/26
Domestic Patent References:
JP2005533754A2005-11-10
JPH10330317A1998-12-15
JPH05117361A1993-05-14
JPH0733809A1995-02-03
JP2005126687A2005-05-19
JP2006104045A2006-04-20
Attorney, Agent or Firm:
Masao Okabe
Nobuaki Kato
Okabe
Shinichi Usui
Ikuo Fujino
Takao Ochi
Norimichi Takanashi
Tsuneo Kobayashi
Masami Saito
Katsuhiko Kimura