Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOPOLYMERIZABLE PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE SHEET STRUCTURE CONTAINING LAYER OF SUCH COMPOSITION
Document Type and Number:
Japanese Patent JPS5633640
Kind Code:
A
Abstract:

PURPOSE: To obtain a resin composition suitable for manufacturing an identification card or the like combined with a photograph by blending a styrene-maleic acid copolymer resin as a stock polymer with an ethylenic unsatd. compound and a photopolymn. initiator.

CONSTITUTION: A styrene-maleic acid copolymer (a) having about 1,000W 2,000mol.wt. and about 130W220 acid value is blended with an about 10W60wt% ethylenic unsatd. compound (b) such as a mixture of 2-hydroxyethyl methacrylate and polyethylene glycol diacrylate, and a photopolymn. initiator (c), preferably a mixture of benzil and dimethylaminobenzaldehyde is further added by about 1W 10wt% to the total amount of the components (a), (b) to obtain a photopolymerizable photosensitive resin composition.


More Like This:
Inventors:
TAKAGI SEISHI
Application Number:
JP10857079A
Publication Date:
April 04, 1981
Filing Date:
August 28, 1979
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ARAI TOKUJI
TAKAGI SEISHI
BIRUGAA TAAKURE
International Classes:
C08F2/00; B42D15/10; C08F2/44; C08F2/48; C08F257/02; C09D4/06; G03F7/027; G03F7/033; (IPC1-7): C08F2/44; C08F2/50; G03C1/68; G03F7/10
Domestic Patent References:
JPS49114416A1974-10-31
JPS49114417A1974-10-31
JPS519812A1976-01-26
JPS5466942A1979-05-29
JPS476330A