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Patent Searching and Data


Title:
PHOTOREACTIVE HARMFUL MATTER REMOVING MATERIAL
Document Type and Number:
Japanese Patent JPH07246340
Kind Code:
A
Abstract:

PURPOSE: To make it possible to handle a photoreactive semiconductor capable of photocatalytically degrading harmful matter under irradiation with light and a carrier in various shapes such as powder and to obtain a photoreactive harmful matter removing material whose base material has various properties such as flexibility.

CONSTITUTION: A photoreactive semiconductor, a carrier and a thermo-plastic resin are enclosed together or separately in a gas permeable sheet to obtain the objective photoreactive harmful matter removing material.


Inventors:
TAKAOKA KAZUCHIYO
HYODO KENJI
EBIHARA ISAO
Application Number:
JP3261994A
Publication Date:
September 26, 1995
Filing Date:
March 02, 1994
Export Citation:
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Assignee:
MITSUBISHI PAPER MILLS LTD
FUJISHIMA AKIRA
HASHIMOTO KAZUHITO
International Classes:
B01J31/06; B01J35/02; B01J35/06; D04H1/559; H01L31/0264; B01D53/86; (IPC1-7): B01J35/02; B01D53/86; B01J31/06; B01J35/06; D04H1/54; H01L31/0264