Title:
ダイヤモンド状物誘導体を含むフォトレジスト組成物
Document Type and Number:
Japanese Patent JP2007507593
Kind Code:
A
Abstract:
Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain a lactone group. Advantages of the present compositions include enhanced resolution, sensitivity, and adhesion to the substrate.
Inventors:
Liu, Shen Gao
Dar, Jeremy, Yi.
Carlson, Robert, M.
Dar, Jeremy, Yi.
Carlson, Robert, M.
Application Number:
JP2006534053A
Publication Date:
March 29, 2007
Filing Date:
September 29, 2004
Export Citation:
Assignee:
Chevron U.S.A. Inc.
International Classes:
C08F220/18; C07C35/44; C07C69/00; C08F220/28; G03C1/76; G03F7/039; H01L21/027; G03F
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Kameoka Mikio
Katsunori Ando
Hajime Asamura
Kameoka Mikio
Katsunori Ando