Title:
PHOTORESIST COMPOSITION AND ITS INDUSTRIAL PRODUCT
Document Type and Number:
Japanese Patent JP2002148803
Kind Code:
A
Abstract:
To provide a high sensitivity photoresist composition comprising a hydroxystyrene polymer having high syndiotacticity and a photosensitive component and excellent in heat resistance.
The photoresist composition contains at least a photosensitive component and a hydroxystyrene polymer having a structural unit of formula (1) (where (m) is an integer of 1-3), a number average molecular weight of ≥600 and a syndiotactic structure whose syndiotacticity is ≥30% as a racemic pentad by 13C-NMR. An industrial product obtained by applying the photoresist composition is provided.
Inventors:
KAWABE MASANAO
MURATA MASAHIDE
KASE TOSHIO
OZAKI HIROYUKI
FUKUI YOSHIFUMI
HOAN TE BAN
JIN JIJU
MIYAZAWA SATORU
HAGIWARA HIDEAKI
TSUCHIHARA KENJI
SUZUKI YASUZO
ASAI MICHIHIKO
MURATA MASAHIDE
KASE TOSHIO
OZAKI HIROYUKI
FUKUI YOSHIFUMI
HOAN TE BAN
JIN JIJU
MIYAZAWA SATORU
HAGIWARA HIDEAKI
TSUCHIHARA KENJI
SUZUKI YASUZO
ASAI MICHIHIKO
Application Number:
JP2000340354A
Publication Date:
May 22, 2002
Filing Date:
November 08, 2000
Export Citation:
Assignee:
NAT INST OF ADV IND & TECHNOL
JAPAN CHEMICAL INNOVATION INST
JAPAN CHEMICAL INNOVATION INST
International Classes:
G03F7/033; C08K5/28; C08K5/34; C08K5/41; C08L25/18; C09D125/18; G03F7/008; H01L21/027; (IPC1-7): G03F7/033; C08K5/28; C08K5/34; C08K5/41; C08L25/18; C09D125/18; G03F7/008; H01L21/027
Domestic Patent References:
| JPH05107753A | 1993-04-30 | |||
| JP2001294619A | 2001-10-23 | |||
| JPH0396951A | 1991-04-22 | |||
| JPH05310834A | 1993-11-22 |
Attorney, Agent or Firm:
Eisuke Fujimoto (2 outside)
Eisuke Fujimoto (2 outside)
Eisuke Fujimoto (2 outside)