PHOTORESIST COMPOSITION FOR ORGANIC FILM OF LIQUID CRYSTAL DISPLAY, SPINLESS COATING METHOD THEREOF, FABRICATION METHOD OF ORGANIC FILM PATTERN USING THE SAME, AND LIQUID CRYSTAL DISPLAY FABRICATED BY THE SAME

Japanese Patent JP2005338831

A

To provide a photoresist composition for the organic film of a liquid crystal display suitable for use on a large-scale substrate.

The photoresist composition for an organic film of a liquid crystal display comprises an organic polymer resin having a mass average molecular weight of 2,000-20,000, a mixed solvent of ethylene diglycol methylethyl ether and a solvent having a vapor pressure lower than the ethylene diglycol methylethyl ether, and a photosensitizer. There are also provided a spinless coating method using the composition, a method for fabricating an organic film pattern, and a liquid crystal display including an organic film pattern fabricated by the composition. By the spinless coating method, coating on a large-scale substrate in a uniform thickness is made possible and defects can be minimized.

LEE YEONG-BEOM
SIN SEON-SU

JP2005148974A

December 08, 2005

May 23, 2005

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SAMSUNG ELECTRONICS CO LTD

C08F220/28; G02F1/1368; G03C1/492; G03F7/023; G03F7/033; G03F7/004; G03F7/00; (IPC1-7): G03F7/004; C08F220/28; G02F1/1368; G03F7/023; G03F7/033

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JP2005017321A	2005-01-20
JP2004212944A	2004-07-29
JP2005326507A	2005-11-24

Yukio Ono
Tomoko Inazumi
Horikawa Kaori

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