To obtain the subject new compound comprising a specific photoresist monomer, suitable for a photoresist having excellent etching resistance and adhesiveness and high sensitivity.
This compound is shown by the formula [R1 and R2 are each COOH or an R-COOH (R is a 1-10C alkyl)] such as 5-norbornene-2,3-dicarboxylic acid)]. The compound of the formula is obtained, for example, by thermally decomposing dicyclopentadiene to give cyclopentadiene, dissolving cyclopentadiene in an organic solvent, cooling and reacting the solution with maleic anhydride while gradually adding maleic anhydride. The reaction is further carried out while gradually raising the temperature to a normal temperature. After the reaction is finished, the organic solvent is removed by a rotary evaporator to give 5-norbornene-2,3-dicarboxylic anhydride by a vacuum distillation method. Then the compound is added to an aqueous solution of NaOH in a reactor and dissolved by stirring. Then the temperature is raised, the solution is refluxed and the temperature is raised to a normal temperature. An aqueous solution of sulfuric acid is dripped into the reaction solution and the objective compound is separated and extracted.
JUNG JAE CHANG
LEE GEUN SU
BAIK KI HO
