PHOTORESIST MONOMER HAVING SULFONYL GROUP, POLYMER, AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Title:

PHOTORESIST MONOMER HAVING SULFONYL GROUP, POLYMER, AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Document Type and Number:

Japanese Patent JP2008111120

Kind Code:

A

Abstract:

To provide a photoresist monomer having a sulfonyl group, polymer, and a photoresist composition containing the same.

The photoresist monomer is represented by the chemical formula, wherein R* is hydrogen or methyl, R1 and R2 are independently a 1-20C alkyl group or without a ketone group, a 4-20C cycloalkyl group, a 6-20C aryl group, or a 7-20C arylalkyl group; any one of R1 and R2 can have no functional group; and R1 and R2 can together form a ring.

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Inventors:

LEE JUNG-YOUL
YU GEUN-JONG
KIM SANG-JUNG
LEE JAE-WOO
KIM DEOG-BAE
KIM JAE-HYUN

Application Number:

JP2007276423A

Publication Date:

May 15, 2008

Filing Date:

October 24, 2007

Export Citation:

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Assignee:

DONGJIN SEMICHEM CO LTD

International Classes:

C08F12/30; C07C309/73; C07D209/86; C07D221/14; G03F7/039

Attorney, Agent or Firm:

Kenichi Morita
Kenjiro Yamaguchi

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