PHOTORESIST MONOMER AND ITS PRODUCTION, PHOTORESIST COPOLYMER AND ITS PRODUCTION, PHOTORESIST COMPOSITION, FORMATION OF PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT

Japanese Patent JP3869166

B2

PROBLEM TO BE SOLVED: To obtain a new compound of a polyalicyclic derivative containing oxygen or sulfur in the cyclic compound, and having hydroxy group, excellent in etching resistance and useful for a photoresist.
SOLUTION: This new compound is a photoresist monomer compound of formula I [X and Y are each O, S, CH2 or the like; (n) is 0-5; A and R1 to R4 are each H, a 1-10C substituted alkyl or the like, with the proviso that one or more thereof are each COOR'-OH (R' is a substituted alkyl)], e.g. 2- hydroxyethyl-7-thiabicyclo[2,2,1]hept-5-ene-2-carboxylate. The compound of formula I is obtained by subjecting a compound of formula II (e.g. thiopene) and a compound of formula III (e.g. 2-hydroxyethyl acrylate) to a Diels-Alder reaction, and further subjecting the product and a compound of formula IV (e.g. furan) to the Diels-Alder reaction.

Chung Zhao Chang
Roh
Chung Min Ho
Root root Kei
Lee Nemori
White base ho

JP24059499A

January 17, 2007

August 26, 1999

Click for automatic bibliography generation  

HYNIX SEMICONDUCTOR INC.

C07D495/08; C07C61/13; C07C69/753; C07D493/08; C07D493/22; C07D495/22; C07D519/00; C08F2/06; C08F4/04; C08F4/34; C08F222/06; C08F222/40; C08F232/00; C08F232/08; C08F234/00; C08K5/00; C08L35/00; C08L45/00; G03F7/039; H01L21/027; G03F7/004; (IPC1-7): C07D495/08; C07D493/08; C08F2/06; C08F4/04; C08F4/34; C08F222/06; C08F222/40; C08F232/00; C08F234/00; C08K5/00; C08L35/00; C08L45/00; G03F7/039; H01L21/027

JP2000038391A
JP11286469A
JP11349637A
JP3587743B2
JP11258802A
JP11327147A
JP10218947A

Hiroshi Arafune
Yoshio Arafune

Previous Patent: IMAGE PICKUP UNIT

Next Patent: OPERATING METHOD FOR PUMP TURBINE