PHOTORESIST MONOMER AND METHOD OF PRODUCING THE SAME, COPOLYMER FOR PHOTORESIST AND METHOD OF PRODUCING THE SAME COPOLYMER, PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT

Title:

Document Type and Number:

Japanese Patent JP3515949

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To obtain a new photoresist monomer usable in a far ultraviolet region.
SOLUTION: This photoresist monomer is represented by formula (1) {E is any of substituent groups represented by formula (40), formula (41) or formula (42) [R1 to R13 are each hydrogen, a 1-10C substituted or a 1-10C unsubstituted straight-chain or side-chain alkyl, cycloalkyl, alkoxyalkyl, cycloalkoxyalkyl, CH2OH or CH2CH2OH] ; R is a substituent group of hydrogen, a 1-10C substituted or a 1-10C unsubstituted straight-chain or side-chain alkyl, cycloalkyl, alkoxyalkyl, cycloalkoxyalkyl, COOR', (CH2)tOH, COO(CH2)tOH or represented by formula (43) (J is a 1-10C substituted or a 1-10C unsubstituted straight-chain or side-chain alkyl, cycloalkyl, alkoxyalkyl or cycloalkoxyalkyl; and d is an integer selected from 0-5); Gs are each a 1-10C substituted or a 1-10C unsubstituted straight-chain or side-chain alkyl, cycloalkyl, alkoxyalkyl or cycloalkoxyalkyl; n is an integer selected from 1-3; m is an integer selected from 0-5; R' is hydrogen, a 1-10C substituted or a 1-10C unsubstituted straight-chain or side-chain alkyl, cycloalkyl, alkocyalkyl or cycloalkoxyalkyl; and t is an integer selected from 0-5}.

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Inventors:

Jung, Min HO.
Jung, Jae Chang
Lee, Geun SU.
Baik KI. HO.

Application Number:

JP2000231613A

Publication Date:

April 05, 2004

Filing Date:

July 31, 2000

Export Citation:

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Assignee:

HYUNDAI ELECTRONICS IND CO LTD

International Classes:

C07D295/08; C07D295/088; C08F2/06; C08F4/04; C08F4/32; C08F232/00; C08K5/00; C08L45/00; G03F7/039; H01L21/027; (IPC1-7): C08F232/00; C07D295/08; C08L45/00; H01L21/027

Attorney, Agent or Firm:

荒船博司（外１名）

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