PHOTORESIST MONOMER, PRODUCTION PROCESS THEREFOR, PHOTORESIST COMPOSITION, METHOD FOR FORMING PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT

Title:

PHOTORESIST MONOMER, PRODUCTION PROCESS THEREFOR, PHOTORESIST COMPOSITION, METHOD FOR FORMING PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT

Document Type and Number:

Japanese Patent JP3705734

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a new photoresist monomer that can be used in the far ultraviolet ray area.
SOLUTION: This monomer is a bicyclo compound represented by formula (1) (B means a group selected from those represented by formula II (R is H, a 1-10C alkyl, -COOR', -(CH2)tOH or represented by formula III).

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Inventors:

Chung Min Ho
Chung Zhao Chang
Lee Nemori
White base ho

Application Number:

JP2000231614A

Publication Date:

October 12, 2005

Filing Date:

July 31, 2000

Export Citation:

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Assignee:

HYNIX SEMICONDUCTOR INC.

International Classes:

C07D211/22; C08F2/06; C08F2/46; C08F4/04; C08F4/34; C08F32/08; C08F232/08; C08K5/00; C08L45/00; G03F7/039; G03F7/38; (IPC1-7): C08F32/08; C07D211/22; C08F2/06; C08F4/04; C08F4/34; G03F7/039; G03F7/38

Domestic Patent References:

JP9500133A
JP10316720A

Attorney, Agent or Firm:

Hiroshi Arafune
Yoshio Arafune

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