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Title:
PHOTORESIST MONOMER, PRODUCTION PROCESS THEREFOR, PHOTORESIST COMPOSITION, METHOD FOR FORMING PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT
Document Type and Number:
Japanese Patent JP3705734
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a new photoresist monomer that can be used in the far ultraviolet ray area.
SOLUTION: This monomer is a bicyclo compound represented by formula (1) (B means a group selected from those represented by formula II (R is H, a 1-10C alkyl, -COOR', -(CH2)tOH or represented by formula III).


Inventors:
Jung, Min HO.
Jung, Jae Chang
Lee, Geun SU.
Baik KI. HO.
Application Number:
JP2000000231614
Publication Date:
October 12, 2005
Filing Date:
July 31, 2000
Export Citation:
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Assignee:
HYUNDAI ELECTRONICS IND CO LTD
International Classes:
C07D211/22; C08F2/06; C08F2/46; C08F4/04; C08F4/34; C08F32/08; C08F232/08; C08K5/00; C08L45/00; G03F7/039; G03F7/38; (IPC1-7): C08F32/08; C07D211/22; C08F2/06; C08F4/04; C08F4/34; G03F7/039; G03F7/38
Domestic Patent References:
JP9500133A
JP10316720A
Attorney, Agent or Firm:
荒船 博司
荒船 良男