Title:
芳香族酸阻害剤を含むフォトレジスト除去剤/洗浄液
Document Type and Number:
Japanese Patent JP2004510204
Kind Code:
A
Abstract:
A stripping and cleaning composition for the removal of residue from metal and dielectric surfaces in the manufacture of semi-conductors and microcircuits. The composition is an aqueous system including organic polar solvents including corrosive inhibitor component from a select group of aromatic carboxylic acids used in effective inhibiting amounts. A method in accordance with this invention for the removal of residues from metal and dielectric surfaces comprises the steps of contacting the metal or dielectric surface with the above inhibited compositions for a time sufficient to remove the residues.
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Inventors:
Darryl W Peters
Floyd El Riddle, Jr.
Floyd El Riddle, Jr.
Application Number:
JP2002530926A
Publication Date:
April 02, 2004
Filing Date:
September 18, 2001
Export Citation:
Assignee:
Ashland Incorporated
International Classes:
B08B3/08; C09D9/00; C11D3/00; C11D7/26; C11D7/50; C11D11/00; C23G1/06; C23G1/18; G03F7/42; H01L21/027; H01L21/304; C11D7/32; H01L21/311; (IPC1-7): G03F7/42; B08B3/08; H01L21/027; H01L21/304
Attorney, Agent or Firm:
Takahisa Kimura