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Title:
フッ化アンモニウムを含有するフォトレジスト除去剤組成物
Document Type and Number:
Japanese Patent JP3742624
Kind Code:
B2
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Inventors:
Yune, Saku-Good
Park, Yang-eun
Oh, Chang-Good
Lee, Sun-Die
Yoon, Jeong-Sun
Application Number:
JP2002504538A
Publication Date:
February 08, 2006
Filing Date:
June 26, 2000
Export Citation:
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Assignee:
Doujin Semichem Company Limited
International Classes:
G03F7/42; C11D7/10; C11D7/26; C11D7/32; C11D7/60; C11D17/00; C11D17/08; H01L21/027
Domestic Patent References:
JP9197681A
JP2000047401A
JP2002535732A
JP2000063895A
Attorney, Agent or Firm:
Takao Suzuki
Koichi Kajisaki
Yuzo Ozaki
Toshihiko Taniguchi



 
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