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Patent Searching and Data


Title:
PHOTORESIST REMOVER COMPOSITION AND REMOVING METHOD
Document Type and Number:
Japanese Patent JPH0954442
Kind Code:
A
Abstract:

To obtain a remover compsn. capable of easily removing residue of a photoresist at a low temp. in a short time and capable of superfine working without corroding a wiring material by specifying the mixing ratio among the components of a compsn. consisting of a specified alkanolamine, hydroxylamine or its deriv., sugar or sugar-alcohol and water.

This remover compsn. consists of 10-70wt.% alkanolamine, alkoxyamine or alkoxyalkanolamine represented by the formula R1R2- NCmH2mOR3, 1-40wt.% hydroxylamine or its deriv., 1-20wt.% sugar or sugar- alcohol and the balance water and preferably further contains 0.01-1.0wt.% surfactant. In the formula, each of R1 and R2 is H, 1-4C alkyl or hydroxyethyl, R3 is H, 1-4C alkyl, hydroxyethyl, methoxyethyl or ethoxyethyl and (m) is an integer of 2-4.


Inventors:
HASEMI TAKASHI
IWATA KEIICHI
HANEDA MAYUMI
IKEDA HIDETOSHI
Application Number:
JP20587695A
Publication Date:
February 25, 1997
Filing Date:
August 11, 1995
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
G03F7/42; H01L21/027; (IPC1-7): G03F7/42; H01L21/027