Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE ACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2014225023
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new photosensitive acid generator compounds (PAGs) and photoresist compositions that comprise the compounds.SOLUTION: The invention relates to photoresist compositions that comprise photosensitive acid generator compounds that generate an α,α-difluoroalkyl sulfonic acid upon exposure to radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are required. The invention also includes methods for synthesis of such PAGs and α,α-difluoroalkyl sulfonic acids.

Inventors:
JAMES F CAMERON
ZYDOWSKY THOMAS M
Application Number:
JP2014125020A
Publication Date:
December 04, 2014
Filing Date:
June 18, 2014
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; C07B61/00; C07C17/263; C07C22/08; C07C303/20; C07C303/32; C07C309/24; C07C381/12; C09K3/00; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP2002131897A2002-05-09
JP2002139838A2002-05-17
JP5918111B22016-05-18
Foreign References:
WO2000008525A12000-02-17
Attorney, Agent or Firm:
Norio Saeki



 
Previous Patent: ILLUMINATION DEVICE, IMAGING DEVICE, AND PORTABLE TERMINAL

Next Patent: LIGHT TRAP, COUPLING DEVICE FOR BEAM PATH, ILLUMINATION DEVICE AND OPTICAL OBSERVATION DEVICE