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Title:
PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER PROVIDED WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2010077389
Kind Code:
A
Abstract:

To provide a photosensitive adhesive composition having a pattern forming property and having an excellent low-temperature thermo-compression bonding property, a high-temperature adhesive property (heat resistance) and moisture resistance reliability after pattern formation and also having an excellent low-temperature adhering property when formed in a film, to provide a film-like adhesive, an adhesive sheet, an adhesive pattern, semiconductor wafer provided with the adhesive, a semiconductor device and a method for manufacturing the semiconductor device using the composition.

The photosensitive adhesive composition contains (A) an alkali-soluble resin, (B) a radiation polymerizable compound, (C) a photoinitiator, (D) a heat radical generator whose 1-minute half-life temperature is 120C and (E) a thermosetting resin.


Inventors:
Mitsukura, Kazuyuki
Kawamori, Takashi
Masuko, Takashi
Katogi, Shigeki
Application Number:
JP2009000095695
Publication Date:
April 08, 2010
Filing Date:
April 10, 2009
Export Citation:
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Assignee:
HITACHI CHEM CO LTD
International Classes:
C09J201/00; C09J4/00; C09J7/00; C09J7/02; C09J11/06; C09J163/00; G03F7/004; G03F7/032; H01L21/301; H01L21/52; H01L25/065; H01L25/07; H01L25/18