PHOTOSENSITIVE AMPHOLYTIC MACROMOLECULAR COMPOUND AND PRODUCTION THEREOF

Title:

PHOTOSENSITIVE AMPHOLYTIC MACROMOLECULAR COMPOUND AND PRODUCTION THEREOF

Document Type and Number:

Japanese Patent JPH0258539

Kind Code:

A

Abstract:

PURPOSE:To obtain the subject polymer excellent in heat and chemical resistance, etc., and suitable for an electrical-electronic device, etc., as a patterned thin film prepared by the LB method film formation by carrying out polymerization partially using a repeating unit containing a hydrophobic group and photosensitive group. CONSTITUTION:With (A) >=2C organic compound with an acidic group (B) >=2C organic compound with an basic group is reacted and linear-repeating units are linked by a bonding group containing a hetero atom to obtain the objective polymer with preferably 2000-300000 number-average molecular weight represented by formula I (R<5> and R<6> contain 10-30C hydrocarbon of 2-14 per 10 repeating units.) and containing orthonitrobenzyl groups of formula II.

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Inventors:

KAMIKITA MASAKAZU
AWAJI HIROSHI

Application Number:

JP21116888A

Publication Date:

February 27, 1990

Filing Date:

August 25, 1988

Export Citation:

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Assignee:

KANEGAFUCHI CHEMICAL IND

International Classes:

G03F7/038; C08G73/10; C08G73/14; G03F7/039; G03F7/16; (IPC1-7): C08G73/10; C08G73/14; G03F7/038; G03F7/039; G03F7/16

Domestic Patent References:

JPS6261673A	1987-03-18
JPS6372375A	1988-04-02
JPS63191831A	1988-08-09

Attorney, Agent or Firm:

Akaoka Mio

Next Patent: JPH0258540