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Patent Searching and Data


Title:
PHOTOSENSITIVE BLACK RESIN COMPOSITION AND RESIN BLACK MATRIX SUBSTRATE
Document Type and Number:
Japanese Patent JP2011227467
Kind Code:
A
Abstract:

To provide a photosensitive black resin composition which can highly accurately form a resin light shielding film having a high OD value and a high resistance value although reflection chromaticity is an achromatic color, enabling a liquid crystal display with superior display characteristics to be obtained by using the photosensitive black resin composition to form the resin light shielding film and using such a color filter.

A photosensitive black resin composition contains at least (A) a light shielding material; (B) a coloring pigment; (C) an alkali-soluble resin; (D) a photopolymerization initiator; (E) a reactive monomer; and (F) an organic solvent. The light shielding material (A) contains at least titanium nitride particles, and the coloring pigment (B) contains at least one kind of red pigment selected from PR254, PR177 and PR179.


Inventors:
INOUE YOSHIHIKO
Application Number:
JP2011052563A
Publication Date:
November 10, 2011
Filing Date:
March 10, 2011
Export Citation:
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Assignee:
TORAY INDUSTRIES
International Classes:
G03F7/004; G02B5/20; G02B5/22; G02F1/1335