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Title:
PHOTOSENSITIVE COMPOSITION BASED ON POLYCYCLIC POLYMER FOR FILM HAVING LOW STRESS AND USED AT HIGH TEMPERATURE
Document Type and Number:
Japanese Patent JP2006022310
Kind Code:
A
Abstract:

To provide a vinyl-added polymer composition and to provide a method for forming the composition and a method for using the composition for forming electronics and optoelectronic devices.

The polymer is composed of a vinyl-added polymer having a main chain having two or more kinds of different type recurring units each obtained from norbornene type monomers, and the first recurring unit is obtained from a glycidyl ether-substituted norbornene monomer represented by formula 1 (wherein X is selected from CH2, CH2-CH2 and O-O and m is 0-5 and at least one of R1, R2, R3 and R4 is a glycidyl ether-containing group) and the second recurring unit is obtained from an aralkyl-substituted norbornene monomer.


Inventors:
Apanius, Chris
Apanius, Matt
Elce, Edmund
Hirano, Takashi
Kusuki, Junya
Shick, Robert
Application Number:
JP2005000136207
Publication Date:
January 26, 2006
Filing Date:
May 09, 2005
Export Citation:
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Assignee:
PROMERUS LLC
International Classes:
C08G59/32; C08F32/00; C08F232/00; C08F234/02; C08G61/06; G03F7/038; H01L21/027
Attorney, Agent or Firm:
社本 一夫
増井 忠弐
小林 泰
千葉 昭男
富田 博行
寺地 拓己