Title:
PHOTOSENSITIVE COMPOSITION FOR FORMING OPTICAL WAVEGUIDE AND OPTICAL WAVEGUIDE
Document Type and Number:
Japanese Patent JP2005258000
Kind Code:
A
Abstract:
To provide a photosensitive composition for forming an optical waveguide which stably exhibits low transmission loss, high heat resistance and high adhesion to such a base material as a silicon wafer for a long period of time.
The photosensitive composition includes 5-50 mass % (meta) acrylate incorporating adamantyl group expressed by a specific formula, 40-94.99 mass % other photo polymerizable compound and 0.01-10 mass % photo polymerization initiator.
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Inventors:
TAKASE HIDEAKI
ERIYAMA YUUICHI
ERIYAMA YUUICHI
Application Number:
JP2004068734A
Publication Date:
September 22, 2005
Filing Date:
March 11, 2004
Export Citation:
Assignee:
JSR CORP
International Classes:
G02B6/12; C08F20/18; C08F220/18; C08F220/26; G02B6/138; (IPC1-7): G02B6/12
Domestic Patent References:
| JPH06256433A | 1994-09-13 | |||
| JPH08211233A | 1996-08-20 | |||
| JP2003292573A | 2003-10-15 | |||
| JP2003206323A | 2003-07-22 | |||
| JP2003172832A | 2003-06-20 |
Attorney, Agent or Firm:
Naoyuki Koda
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