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Title:
PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2007108629
Kind Code:
A
Abstract:

To provide a photosensitive composition having high sensitivity and very high storage stability and capable of efficiently forming a pattern with high definition, to provide a pattern forming material and a photosensitive laminate in which the photosensitive composition has been laminated, and to provide a pattern forming apparatus and a pattern forming method.

The photosensitive composition contains at least a binder, a polymerizable compound and a photopolymerization initiation compound, wherein the photopolymerization initiation compound contains an acridone compound and an oxime derivative. The pattern forming material includes a support and at least a photosensitive layer formed of the photosensitive composition on the support. The photosensitive laminate includes a photosensitive layer formed of the photosensitive composition. The pattern forming apparatus is equipped with the photosensitive laminate and includes at least a light illuminating means and a light modulating means. The pattern forming method includes at least exposing the photosensitive layer in the photosensitive laminate.


Inventors:
TAKASHIMA MASANOBU
IKEDA TAKAMI
Application Number:
JP2006006649A
Publication Date:
April 26, 2007
Filing Date:
January 13, 2006
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
G03F7/031; C08F290/06; C08F290/12; G03F7/004; G03F7/027; G03F7/033; G03F7/11; G03F7/20; H05K3/00; C07D209/86; C07D219/06; C07D295/12; C07D303/27; C07D335/16
Attorney, Agent or Firm:
Koichi Hirota
Yoshihiro Nagare
Naoko Matsuda