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Title:
PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE SAME AND PRODUCTION OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3720970
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. which has extremely little absorption on a light source of a short wavelength and has excellent solubility, alkaline developability, resolution and dry etching resistance by incorporating a polymer including a structure of a terpenoid skeleton or alicyclic skeleton and a substd. or unsubstd. silyl group in this compsn.
SOLUTION: This photosensitive compsn. contains the polymer including the structure of the terpenoid skeleton or alicyclic skeleton and the substd. or unsubstd. silyl group. The terpenoid skeleton is the basic skeleton derived from a terpenoid compd. The terpenoid compd. is a hydrocarbon which adapts itself nearly to an isoprene rule and consists of (C5H8)n as a basic compsn., an oxygen contained compd. derived from this hydrocarbon as well as a compd. varying in unsaturation degrees or the precursor and deriv. of the compd. Such terpenoid compd. includes a monoterpene hydrocarbon, monoterpene alcohol, monoterpene aldehyde, etc.


Inventors:
Shinoda, Naomi
Nakase, Makoto
Gokochi, Toru
Asakawa, Kouji
Okino, Takashi
Application Number:
JP1998000004729
Publication Date:
November 30, 2005
Filing Date:
January 13, 1998
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
G03F7/033; C08F232/08; G03F7/039; G03F7/075; H01L21/027; (IPC1-7): G03F7/075; C08F232/08; G03F7/033; G03F7/039; H01L21/027
Domestic Patent References:
JP3149554A
JP3289658A
JP7140667A
JP7253673A
JP8082925A
JP9120162A
JP9211864A
JP10003169A
JP62038451A
JP62040450A
Attorney, Agent or Firm:
佐藤 一雄
小野寺 捷洋
野一色 道夫
中村 行孝