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Patent Searching and Data


Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002323764
Kind Code:
A
Abstract:

To provide a photosensitive composition which gives a lithographic printing plate having excellent wear resistance, printing durability and chemical resistance and high printing durability even when printing is performed by using UV ink without burning treatment, and moreover, which gives a lithographic printing plate having a wide range of conditions for development and causing no contamination during printing.

The photosensitive composition contains an o-naphthoquinone diazide and a vinyl polymerizable high polymer compound insoluble with water and soluble with an alkaline a aqueous solution. The vinyl polymerizable high polymer compound is a copolymer containing at least each one kind of monomer unit derived from a compound having alkali-soluble groups expressed by specified general formula and derived from a compound having ester groups expressed by specified general formula.


Inventors:
FUJITA KAZUO
TAN SHIRO
Application Number:
JP2001064548A
Publication Date:
November 08, 2002
Filing Date:
March 08, 2001
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/033; C08F220/26; C08F220/38; C08F220/56; C08F290/06; C08K5/28; C08L33/14; C08L33/26; G03F7/00; (IPC1-7): G03F7/033; C08F220/26; C08F220/38; C08F220/56; C08F290/06; C08K5/28; C08L33/14; C08L33/26; G03F7/00
Attorney, Agent or Firm:
Minoru Nakamura (9 outside)