Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2011075786
Kind Code:
A
Abstract:
To provide a photosensitive composition having sufficient light reflection performance, as well as, capable of obtaining a cured material superior in heat resistant crack and workability.
The photosensitive composition contains at least one component from among a polymerizable hydrocarbon monomer and a polymerizable hydrocarbon polymer, hollow particles and a photopolymerization initiator. Porosity of the hollow particles is 30-99 vol.%, and the average particle size of the hollow particles is 0.1-20 μm.
Inventors:
NAKAMURA HIDE
NISHIMURA TAKASHI
SHIKAGE TAKASHI
TAKAHASHI TOSHIO
WATANABE TAKASHI
INAOKA MIKI
OMURA TAKAHIRO
MAENAKA HIROSHI
NISHIMURA TAKASHI
SHIKAGE TAKASHI
TAKAHASHI TOSHIO
WATANABE TAKASHI
INAOKA MIKI
OMURA TAKAHIRO
MAENAKA HIROSHI
Application Number:
JP2009226503A
Publication Date:
April 14, 2011
Filing Date:
September 30, 2009
Export Citation:
Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
G03F7/032; C08F2/44; C08F2/48; C08F290/00; C08F299/02
Attorney, Agent or Firm:
宮▲崎▼ 主税
Table of contents Makoto
Table of contents Makoto