Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2019168654
Kind Code:
A
Abstract:
To provide a photosensitive providing exposure margin satisfactorily.SOLUTION: There are provide a photosensitive composition containing a polymer having a structural unit derived from at least one kind selected from a group consisting of a polymerization initiator containing an oxime ester compound represented by the following general formula (I), a polymerizable compound, and unsaturated polybasic acid and unsaturated polybasic acid anhydride, and a structural unit derived from a monomer having a cyclic ether structure with 2 to 4 carbon atoms, and an ethylenic unsaturated bond, a colored photosensitive composition and a cured thereof. The photosensitive composition has efficient exposure margin and is useful as a transparent insulation film. In the formula, see definitions given in the description for Rto R, and n represents 0 or 1.SELECTED DRAWING: None
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Inventors:
SATO NAOMI
TAKEUCHI YOSHITOMO
MIHARA HIROKI
TAKEUCHI YOSHITOMO
MIHARA HIROKI
Application Number:
JP2018058516A
Publication Date:
October 03, 2019
Filing Date:
March 26, 2018
Export Citation:
Assignee:
ADEKA CORP
International Classes:
G03F7/031; C07D209/14; C07D303/06; C08F2/44; C08F2/50; C08F20/32; C08F22/00; G03F7/004; G03F7/033; G03F7/038
Attorney, Agent or Firm:
Michiharu Soga
Kajinami order
Kazuhiro Oyaku
Saori Sato
Kajinami order
Kazuhiro Oyaku
Saori Sato