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Patent Searching and Data


Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JPH06266100
Kind Code:
A
Abstract:

PURPOSE: To obtain a resist having high contrast and high sensitivity by preparing the photosensitive compsn. from a compd. having substitutents which is decomposed by acid, a compd. which produces acid by irradiation with chemical radiation, and a compd. which neutralizes acid and is decomposed by irradiation with chemical radiation.

CONSTITUTION: In an unexposed area of a resist layer 12, an acid generated by heating after exposure and an acid 17 diffused from an exposed area 14 are generated, but the excess acid is trapped by a compd. 18 included in the resist layer, neutralizing acid and decomposed or lowered in the neutralizing strength of acid by irradiation with chemical radiation. Thus, the concentration of acid is decreased. On the other hand, in the exposed area 14, the compd. 18 is decomposed or lowered in its neutralization strength so that the concentration of acid is not affected by the compd. Thereby, the difference of amounts of produced acid between in the exposed area and unexposed area is enlarged, thereby, the reaction amt. of compd. having substitutents decomposed by acid increases. As a result, the difference of solubility to a developer at the time of development is increased and contrast in the resist pattern is enhanced.


Inventors:
NAITO TAKUYA
KIHARA NAOKO
Application Number:
JP5439893A
Publication Date:
September 22, 1994
Filing Date:
March 15, 1993
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
G03F7/004; G03F7/029; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/029; G03F7/038; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Noriyuki Noriyuki