Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOSENSITIVE COMPOUND AND PHOTOSENSITIVE POLYMER COMPOSED OF THE COMPOUND
Document Type and Number:
Japanese Patent JP2012087286
Kind Code:
A
Abstract:

To provide a photosensitive compound suitable for a photo-alignment method and a photosensitive polymer composed of the compound.

The photosensitive compound is represented by formula (1). In formula (1), Y1 is a bivalent group which is represented by formula (2-1) or (2-2).


Inventors:
OTSUKI DAISUKE
NARA KAZUMI
INAGAKI JUNICHI
TANABE MAYUMI
Application Number:
JP2011172582A
Publication Date:
May 10, 2012
Filing Date:
August 08, 2011
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
JNC CORP
JNC PETROCHEMICAL CORP
International Classes:
C08F22/12; C09K19/56; G02F1/1337
Domestic Patent References:
JPH09118717A1997-05-06
JPH10310613A1998-11-24
JP2003313252A2003-11-06
JP2005128201A2005-05-19
JP2007304215A2007-11-22