Title:
PHOTOSENSITIVE COMPOUND AND PHOTOSENSITIVE POLYMER COMPOSED OF THE COMPOUND
Document Type and Number:
Japanese Patent JP2012087286
Kind Code:
A
Abstract:
To provide a photosensitive compound suitable for a photo-alignment method and a photosensitive polymer composed of the compound.
The photosensitive compound is represented by formula (1). In formula (1), Y1 is a bivalent group which is represented by formula (2-1) or (2-2).
Inventors:
OTSUKI DAISUKE
NARA KAZUMI
INAGAKI JUNICHI
TANABE MAYUMI
NARA KAZUMI
INAGAKI JUNICHI
TANABE MAYUMI
Application Number:
JP2011172582A
Publication Date:
May 10, 2012
Filing Date:
August 08, 2011
Export Citation:
Assignee:
JNC CORP
JNC PETROCHEMICAL CORP
JNC PETROCHEMICAL CORP
International Classes:
C08F22/12; C09K19/56; G02F1/1337
Domestic Patent References:
JPH09118717A | 1997-05-06 | |||
JPH10310613A | 1998-11-24 | |||
JP2003313252A | 2003-11-06 | |||
JP2005128201A | 2005-05-19 | |||
JP2007304215A | 2007-11-22 |
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